Root-Cause Analysis and Statistical Process Control of Epilayers for SiGe:C Hetero-Structure Bipolar Transistors

摘要

The SiGe:C hetero-structure bipolar transistor (HBT) has turned into a key technology for wireless communication. This paper describes various critical analytical techniques to bring up and maintain the SiGe:C epi-process. Two types of analysis are critical, (1) routine monitoring SiGe base and Si cap thickness, doping dose, Ge composition profile, and their uniformity across the wafer; and (2) root-cause analysis on problems due to non-optimized process and variation in process conditions. A transmission electron microscopy (TEM) technique has been developed allowing a thickness measurement with a reproducibility better than 3 A. Charge-compensated low-energy secondary ion mass spectrometry (SIMS) using optical conductivity enhancement (OCE) allows a Ge composition measurement to a required precision of 0.5 at.%.