aluminium compounds; vapour phase epitaxial growth; wide band gap semiconductors; MOCVD; photolithography; sputter etching; acoustic wave propagation; surface acoustic wave transducers; III-V semiconductors; semiconductor epitaxial layers; surface morphology; AlN epitaxial film; 6H-SiC(0001) substrate; MOCVD; SAW device fabrication; aluminum nitride (AlN)(0001) epitaxial films; metal organic chemical vapor deposition; photolithography; reactive ion etching; SAW propagation; surface acoustic wave; IDT; interdigital transducer; phase velocity calculation; sapphire(0001) structure; surface cracks; 1100 degC; 1 micron; 2.747 GHz; SiC; AlN;
机译:用于GHz频段电声器件的低温溅射在Al2O3(0001)上的高质量AlN厚膜的结构,光学和声学特性
机译:MOCVD法在6H-SiC(0001)上外延生长SnO_2薄膜
机译:AlN MOCVD缓冲层在6H-SiC(0001)衬底上生长AlN单晶
机译:用于GHz波段声表面波器件的MOCVD在6H-SiC(0001)上的AlN外延膜
机译:通过发光光谱和X射线衍射测定在6H-SiC(0001)衬底上生长的GaN和Al(x)Ga(1-x)N薄膜的应变和组成。
机译:脉冲激光沉积制备6H-SiC(0001)衬底上VO2薄膜的增强的相变特性
机译:硅掺杂对MOCVD在n型6H-SiC上生长的AlN薄膜场发射特性的影响