首页> 外文会议>NATO advanced research workshop on green industrial applications of ionic liquids >ELECTROCHEMISTRY OF NIOBIUM, TANTALUM AND TITANIUM IN LOW-TEMPERATURE CARBAMIDE-HALIDE MELTS
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ELECTROCHEMISTRY OF NIOBIUM, TANTALUM AND TITANIUM IN LOW-TEMPERATURE CARBAMIDE-HALIDE MELTS

机译:低温碳酰胺卤化物熔融铌,钽和钛的电化学

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The electroohemical behaviour of melts containing carbamide {urea; CO(NH_2)_2} at inert electrodes and the anodic dissolution of niobium, tantalum and titanium in carbamide-ammonium and alkali halide melts, as well as the structure of the complex ions formed, have been studied by electrochemical and spectroscopic methods. In carbamide-containing melts, all metals are passivated. In carbamide-chloride melts, a metal dissolution depassivator is a product of anodic oxidation of carbamide and [NH_4]Cl. Due to the different degrees of metal passivation, the electrochemical dissolution mechanisms of the metals are different, and their electroactivities decrease in the order Ti > Nb > Ta. In carbamide-[NH_4]F melt, fluoride ions have a depassivating effect on the dissolution of metals.
机译:含有氨基甲酰胺的熔化的电杂物行为{尿素;通过电化学和光谱方法研究了惰性电极的CO(NH_2)_2}和碳酰胺 - 铵和碱金属卤化物熔体中的氧化钽和钛和碱卤化物熔体的阳极溶解,以及复杂离子的结构。在含氨基甲酰胺的熔体中,所有金属钝化。在氨基甲酰胺熔融中,金属溶解Depassiver是氨基甲酰胺的阳极氧化和[NH_4] Cl的产物。由于金属钝化程度不同,金属的电化学溶解机制是不同的,并且它们的电刺激率为Ti> Nb> Ta的顺序降低。在氨基甲酰胺 - [NH_4] F熔体中,氟离子对金属溶解具有沉积的效果。

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