Absorptance measurement of nonlinear crystals by calorimetric method at 1064 and 532 nm

机译：1064和532 nm在1064和532 nm下量热法测量非线性晶体的吸收率测量

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We report polarization dependent measurements of absorptance of some crystals performed according to the ISO 11551 standard by the "pulse" or "gradient" calorimetric method at 1064 and 532 nm using a pulsed, diode-pumped, Q-switched YAG:Nd laser.

机译：我们通过1064和532nm在1064和532nm下通过1064和532nm在1064和532nm下通过1064和532nm进行的一些晶体的吸收率报告极化依赖性测量。

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《Conference on nonlinear optical phenomena》|2002年||共6页
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中图分类非线性光学（强光与物质的作用）;
关键词
absorption; absorptance; calorimetric measurements; pulse and gradient methods; nonlinear crystals;

机译：吸收;吸收率;量量测量;脉冲和梯度方法;非线性晶体;

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专利

1. Measurements of the third- and fifth-order optical nonlinearities of water at 532 nm and 1064 nm using the D4 sigma method (vol 39, pg 5046, 2014) [J] . Schnebelin Come, Cassagne Christophe, de Araujo Cid B., Optics Letters . 2018,第20期

机译：使用D4 Sigma方法（Vol 39，PG 5046,2014）测量532nm和1064nm的水的第三和第五阶光学非线性的测量
2. Measurements of the third- and fifth-order optical nonlinearities of water at 532 and 1064 nm using the D4σ method [J] . Come Schnebelin, Christophe Cassagne, Cid B. de Araujo, Optics Letters . 2014,第17期

机译：使用D4σ方法测量532和1064 nm处水的三阶和五阶光学非线性
3. Two-Photon absorption cross-section measurement by thermal lens and nonlinear transmission methods in organic materials at 532 nm and 1064 nm laser excitations [J] . Taouri A, Derbal H, Nunzi JM, Journal of optoelectronics and advanced materials . 2009,第11期

机译：在有机材料中，在532 nm和1064 nm的激光激发下，通过热透镜和非线性透射法测量双光子吸收截面
4. Absorptance measurement of nonlinear crystals by calorimetric method at 1064 and 532 nm [C] . Conference on nonlinear optical phenomena . 2002

机译：1064和532 nm在1064和532 nm下量热法测量非线性晶体的吸收率测量
5. Electro Optical Frequency Modulation on Silicon Integrated Circuits With 1300nm and 1064nm Laser Sources =Electro-Optical-Frequency-Modulation (EOFM) an siliziumbasierten integrierten Schaltungen mit 1300nm und 1064nm Laser [D] . Pagano, Carlo. 2015

机译：用1300nm和1064nm激光源的硅集成电路电光频率调制=用1300nm和1064nm激光的基于硅基集成电路的电光频调制（EOFM）
6. Prospective Comparison Study of 532/1064 nm Picosecond Laser vs 532/1064 nm Nanosecond Laser in the Treatment of Professional Tattoos in Asians [O] . Taro Kono, Henry H.L. Chan, William F. Groff, 2020

机译：532/1064 nmPic秒激光与532/1064 nm纳秒激光治疗亚洲人专业纹身的前瞻性比较研究
7. Measurements of the third- and fifth-order optical nonlinearities of water at 532 and 1064 nm using the D4σ method [O] . C. Schnebelin, C. Cassagne, C.B. de Araújo, 2014

机译：使用D4σ方法测量532和1064nm水的三阶和五阶光学非线性

Absorptance measurement of nonlinear crystals by calorimetric method at 1064 and 532 nm

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