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Excitonic diamagnetic shifts and magnetic field dependent linewidths in Al{sub}xGa{sub}(1-x)As alloys

机译:Al {Sub} XGA {sub}(1-x)中的激子磁场偏移和磁场依赖于偏宽作为合金

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We report measurements of both the diamagnetic shifts and the linewidths of excitonic transitions in Al{sub}xGa{sub}(1-x)As alloys as a function of Al concentration and magnetic field at 1.4 K using photoluminescence spectroscopy. The magnetic field was varied from 0 to 13 tesla and Al composition in our samples ranged from 0 to 30%. The samples were grown on GaAs substrates oriented along [001] direction using molecular beam epitaxy at 590°C. We find that for a given value of alloy composition, both the diamagnetic shift and excitonic linewidth increase as a function of magnetic field. To explain our experimental data we propose that the excitons are localized in a very specific manner. To simulate this localization, we assume that the exciton reduced mass is effectively increased and is obtained by using the alloy dependent heavy-hole mass along (001) direction treated isotropically. The calculated values of the variations of the diamagnetic shift and excitonic linewidth as a function of magnetic field obtained using this model agree very well with those reported here.
机译:我们在使用光致发光光谱法以1.4k的函数和1.4k时,在Al {sum} XGA {sub}(1-x)中的抗磁性转变和激发器转变的态度和磁场的函数报告测量。在我们的样品中,磁场在0至13个Tesla和Al组合物中变化,范围为0至30%。使用590℃的分子束外延在沿着[001]方向为取向的GaAs基底上生长样品。我们发现,对于合金组成的给定值,抗磁移和激发力线宽随着磁场的函数而增加。为了解释我们的实验数据,我们建议主激子以非常具体的方式定位。为了模拟这种定位,假设激子减少质量有效地增加,并且通过使用各向同性处理的合金依赖性重孔质量来获得。作为使用该模型获得的磁场函数的抗磁移和激发线宽的变化的计算值与此处报告的那些相一致。

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