Formation of titanium dioxide micropattern by direct synthesis from aqueous solution and transcription of resist pattern

摘要

Submicron-scale resist pattern was printed on the surface of CrN-coated silicon single crystal wafer substrate by photolithography. The substrates was soaked in a mix solution of (NH{sub}4){sub}2TiF{sub}6 and B{sub}2O{sub}3 under ordinary temperature and ordinary pressure. Formation of Titanium dioxide thin film was confirmed by thin film X-ray diffraction measurement. Then the substrate was soaked in acetone with ultrasonic vibration. The resist material was dissolved off with Titanium dioxide thin film formed just on. Micropattern of Titanium dioxide with minimum size of 0.3 μm transcribing the resist pattern was formed on the substrate. This method is promising for producing micropattern of electronic devices and so on.