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Understanding Whisker Phenomenon - Driving Force For The Whisker Formation

机译:了解晶须现象 - 晶须形成的驱动力

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The physical, chemical and structural properties of electroplated Sn and whiskers are studied using various techniques including X-Ray diffraction (XRD), Focussed Ion Beam (FIB), 5 canning Auger microscopy (SAM) and SEM/EDS. From the results of these studies we conclude that the driving force for the whisker formation is the compressive stress in the Sn coating. The tensile stress in the Sn coating, on the other hand, will hinder the whisker formation. This understanding provides the foundation for the whisker prevention remedies, which we offer to the electronic industry.
机译:使用包括X射线衍射(XRD),聚焦离子束(FIB),5罐速率显微镜(SAM)和SEM / EDS的各种技术研究了电镀Sn和晶须的物理,化学和结构性。从这些研究的结果,我们得出结论,晶须形成的驱动力是Sn涂层中的压缩应力。另一方面,Sn涂层中的拉伸应力将阻碍晶须形成。这种理解为我们提供给电子行业的晶须预防补救措施提供了基础。

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