STRUCTURAL AND ELECTROCHEMICAL PROPERTIES OF V_2O_5 THIN FILMS OBTAINED BY ATOMIC LAYER CHEMICAL VAPOR DEPOSITION (ALCVD)

摘要

There is growing interest in producing thin film lithium batteries for microelectronic applications. The vanadium pentoxide (V_2O_5) is a compound of high interest having found use in a wide range of applications. Among them is its use as a rechargeable cathodic material in lithium batteries. V_2O_5 thin films were deposited by several methods (sol-gel, sputtering, chemical vapor deposition and pulse-laser deposition). In this study, we use for the first time the atomic layer chemical vapor deposition (ALCVD) as deposition method for V_2O_5 films.