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Evaluation of a Novel Polyimide for Use as a Low-Loss, Low Dielectric Constant Interlayer in Electronic Packaging Applications

机译:用作电子包装应用中用作低损耗,低介电常数中间层的新型聚酰亚胺的评价

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Low molecular weight fluorinated polyimide oligomers have been synthesized with controlled molecular weight and thermally cured under an inert atmosphere to produce low dielectric constant materials. Prior to curing, several of the fully imidized oligomers exhibited excellent solubility and low solution viscosity in NMP at concentrations as high as 40-50 weight percent. The relatively low viscosity and high flow properties should lead to good planarity. After curing, ductile films were obtained which displayed a high glass transition temperature (Tg) of well over 300 °C with a significant elastic modulus above Tg. The cured films also demonstrated excellent solvent resistance. This was in contrast to previously reported fluorinated imide systems, which have desirable properties, but very poor solvent resistance. Additionally, preliminary observations suggested that the new polyimide materials may adhere well to copper, silicon and other polyimide films when cured on these substrates. Confirmation of low dielectric constant behavior was obtained from preliminary refractive index measurements of a film which gave a value of 1.584. The low estimated dielectric constant of the new fluorinated polyimide endorses its use as an interlayer dielectric in MCM-D applications. Circuit structures utilizing this material would display lower propagation delays, making them ideal for high-speed digital electronics.
机译:低分子量氟化聚酰亚胺低聚物已经通过受控分子量合成,并在惰性气氛下热固化以产生低介电常数材料。在固化之前,几种完全酰亚胺化的低聚物在NMP中表现出优异的溶解度和低于高达40-50重量%的浓度的溶解度和低溶液粘度。相对低的粘度和高流动性能应导致良好的平面性。在固化后,获得延性膜,其在300℃下显示出高玻璃化转变温度(Tg),其具有高于Tg的显着弹性模量。固化的薄膜还表现出优异的耐溶剂性。这与先前报道的氟化酰亚胺系统相反,具有所需的性质,但耐溶剂性极差。另外,初步观察表明,当在这些基材上固化时,新的聚酰亚胺材料可以粘附到铜,硅和其他聚酰亚胺膜上。从薄膜的初步折射率测量获得,获得低介电常数的确认,该膜的薄膜的值为1.584。新型氟化聚酰亚胺的低估计介电常数是MCM-D应用中的用作层间电介质的用途。利用该材料的电路结构将显示较低的传播延迟,使其成为高速数字电子设备的理想选择。

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