首页> 外文会议>International Conference on Advanced Materials and Structures >NANOCOMPOSITE (Fe,Ni) - SiO{sub}2 THIN FILMS CLOSE TO THE PERCOLATION THRESHOLD: MICROSTRUCTURAL AND MAGNETOTRANSPORT PROPERTIES
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NANOCOMPOSITE (Fe,Ni) - SiO{sub}2 THIN FILMS CLOSE TO THE PERCOLATION THRESHOLD: MICROSTRUCTURAL AND MAGNETOTRANSPORT PROPERTIES

机译:纳米复合材料(Fe,Ni) - SiO {Sub} 2薄膜接近渗透阈值:微观结构和磁传输性能

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Granular ferromagnetic - insulator thin films consist of nanometer size ferromagnetic particles embedded in an insulating medium. They display a wide variety of magnetic and transport properties related to their unique nanostructure. Close to the percolation threshold they exhibit giant extraordinary Hall effect and nonlinear transport. In this paper some experimental results concerning the influence of the annealing temperature and compositions close to the percolation threshold on the microstructural and magnetotransport properties of (Fe{sub}20Ni{sub}80){sub}x-(SiO{sub}2){sub}(1-x) thin films are presented. The (Fe{sub}20Ni{sub}80){sub}x-(SiO{sub}2){sub}(1-x) thin films with metal content values between about 40% and 70% were deposited by R.F. sputtering technique from composite target. The samples were deposited on various substrates depending on the intended measurements. The (Fe{sub}20Ni{sub}80){sub}x-(SiO{sub}2){sub}(1-x) were thermally treated in vacuum at temperatures between at 300 and 400°C. The structural properties of the thin films are analysed by X-ray diffraction and morphology was investigated by transmission electron microscopy. The Hall voltage measurements were made at room temperature, by the van der Pauw method. Our results show that the microstructural and transport properties of the (Fe{sub}20Ni{sub}80){sub}x-(SiO{sub}2){sub}(1-x) thin films vary with composition and annealing temperature. At the percolation threshold we have evidentiated the crucial changes in the microstructure and Hall voltage values.
机译:颗粒状铁磁 - 绝缘体薄膜由嵌入在绝缘介质中的纳米尺寸铁磁性颗粒组成。它们显示出与其独特的纳米结构相关的各种磁性和运输性质。接近他们展示巨型非凡霍尔效应和非线性运输的渗透阈值。本文在(Fe {Sub} 20ni} 80){sub} x-(sio {sub} 2)的情况下,一些关于退火温度和组合物的影响的一些实验结果与近渗透阈值接近的渗透阈值{sub}(1-x)薄膜。 (Fe {sub} 20ni {sub} 80){sub} x-(siO {sub} 2){sub}(1-x)薄膜,金属含量值在约40%和70%之间沉积,R.F.复合目标溅射技术。根据预期的测量,将样品沉积在各种底物上。 (Fe {sub} 20ni {sub} 80){sub} x-(siO {sub} 2){sub}(1-x)在300和400℃之间的温度下真空热处理。通过X射线衍射分析薄膜的结构性质,并通过透射电子显微镜研究了形态学。通过van der Pauw方法,在室温下进行霍尔电压测量。我们的结果表明,(Fe {sub} 20ni {sub} 80){sub} x-(siO {sub} 2){sub}(1-x)薄膜的微观结构和传输特性随组合物和退火温度而变化。在渗透阈值下,我们已经证明了微观结构和霍尔电压值的关键变化。

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