New Manufacture Process for Silicon Nitride Ball

摘要

As the improvement of request, common machining methods for machining silicon nitride balls using expensive diamond abrasive, high loads, and low polishing speed is unfit for its long machining time, high cost and poor machining quality. Lots of subsurface defects such as deep pits, scratch, and microcracks and surface damage, such as the large lateral and radial/median cracks, can be observed on the surface. In this paper, the new ultra-precision manufacture technologies are introduced, such as magnetic float polishing ( MFP ) and chemical mechanical polishing (CMP). A new water-based slurry used in polishing process is developed to improve the machining efficiency and surface quality. Finally, a new machining method based on ELID ( Electroly In-Process Dressing) technology that would improve machining efficiency of rough abrading and lapping process obviously is put forward.