Gold-coated silicon nitride mirrors designed for two orthogonal rotations were fabricated. The devices were patterned out of nitride using surface micromachining techniques, and then released by a sacrificial oxide etch and bulk etching the silicon substrate. Vertical nitride ribs were used to stiffen the members and reduce the curvature of the mirrored surfaces due to internal stress in the nitride and the metal layer. This was accomplished by initially etching the silicon substrate to form a mold that was filled with nitride to create a stiffening lattice-work to support the mirrored section. Mirror diameters ranging from 100 μm to 500 μm have been fabricated, with electrostatic actuation used to achieve over four degrees of tilt for each axis.
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