CMP: the access to advanced low cost manufacturing

摘要

Summary form only given, as follows. CMP aims at providing Universities, Research Laboratories and industries with the possibility to have their integrated circuits projects fabricated for prototyping and low volume production. Presently, users are serviced for CMOS double layer poly/double layer metal (DLP/DLM) 0.8/spl mu/, DLM/TLM 0.6 /spl mu/, DLP/4LM 0.35 /spl mu/, SLP/6LM 0.25 /spl mu/, SLP/6LM 0.18 /spl mu/, BiCMOS DLP/DLM 0.8 /spl mu/, SiGe HBT 0.8 /spl mu/ DLP/DLM, SiGe HBT 0.35 /spl mu/ SLP/5LM and GaAs HEMT 0.2 /spl mu/. About 40 multi-project runs are offered per year. Micro Electro Mechanical Systems (MEMS) are also provided in standard CMP runs in CMOS DLP/DLM 0.8 /spl mu/ 0.6 /spl mu/, BiCMOS DLP/DLM 0.8 /spl mu/ and HEMT GaAs 0.2 /spl mu/, using compatible front-side bulk micro-machining. MUMPS process is offered as a surface micromachining allowing one to integrate MEMS only microstructures. Finally, the main processes for Multi-Chip Modules (MCMs) are also accessible through CMP. CMP has introduced very advanced processes during the 3 last years : 0.25 /spl mu/m CMOS in 1997, 0.18 /spl mu/m CMOS in 1999, 0.5 /spl mu/m Silicon On Sapphire in 2000, and the 0.35 /spl mu/m HBT BiCMOS in 2001. Those processes represent a challenge for CAD design, applications, and training. We will present the process and design-kits features for those advanced technologies, and give some results on the dissemination and support activity at CMP. Accessing advanced and state of the art processes gives to the academic/research community a high quality of engineering education and a high quality of research.