A relatively simple technique for fabrication of GaAs-based quasi-3D photonic crystals has been investigated. Selective impurity-induced layer disordering and wet oxidation techniques are utilized. The feasibility of this technique is successfully demonstrated and a photonic bandgap material with its bandgap around 1.18 $mu@m has been fabricated. The electro-optic coefficients have been measured for the first time in such a medium. The process is reproducible an lends itself to integration with other optoelectronic and electronic devices on the same substrate, which might be required for pumping, electrical injection or other functions.
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机译:研究了一种相对简单的制造基于GaAs的准基相光子晶体的技术。利用选择性杂质诱导的层失调和湿氧化技术。成功地证明了该技术的可行性,并且已经制造了其带隙约为1.18 $ MU @ M的光子带隙材料。在这种介质中首次测量电光系数。该过程是可再现的,其自身与相同基板上的其他光电和电子设备集成,这可能需要泵送,电气注入或其他功能。
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