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High-Voltage LiNi_(0.5)Mn_(1.5)O_4 Thin Film Cathode Prepared by RF Sputtering

机译:高压LINI_(0.5)MN_(1.5)O_4薄膜阴极通过RF溅射制备

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Thin films of LiNi_(0.5)Mn_(1.5)O_4 were prepared on stainless steel substrates using reactive radio-frequency sputtering method. The crystallinity of the post-annealed films at different temperatures after deposition at room temperature was studied, using XRD. Electrochemical properties of LiNi_(0.5)Mn_(1.5)O_4 thin film cathodes were investigated using charge/discharge voltage curve against a lithium foil anode. The crystallinity and the electrochemical characteristics of post-annealed temperature are not consistent with each other. Among them, the best electrochemical characteristics were obtained at 600°C. To further analyze the reason, additional SIMS measurement was performed.
机译:使用反应射频溅射法在不锈钢基板上制备LINI_(0.5)MN_(1.5)O_4的薄膜。使用XRD研究了在室温下沉积后沉积后的不同温度的后退火膜的结晶度。使用对锂箔阳极的电荷/放电电压曲线研究了LINI_(0.5)MN_(1.5)O_4薄膜阴极的电化学性质。结晶度和后退火温度的电化学特性彼此不一致。其中,在600℃下获得最佳的电化学特性。为了进一步分析原因,执行额外的SIMS测量。

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