首页> 外文会议>IEEE/EIA International Frequency Control Symposium >Growing the large lanthanum gallium silicate single crystals by Czochralski method
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Growing the large lanthanum gallium silicate single crystals by Czochralski method

机译:通过Czochralski方法生长大镧镓硅酸盐单晶

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The authors have developed industrial technology to grow large single crystals of langasite having diameter of 86 mm and cylinder length of 100 mm. They were grown in the direction of the temperature compensated cuts (+48.5/spl deg/; +50/spl deg/; +54/spl deg/ to Y-axis) with Czochralski method. The present technology allows to make 3" (76.2 mm) langasite wafers. This diameter ensures the low losses of units by the wafer periphery in relation to the total number of units on the whole wafer surface. To grow langasite in direction of the temperature compensated cuts in contrast to Z-direction allows to make wafers by sawing ingots perpendicularly to the crystal axis.
机译:作者开发了工业技术,种植兰纳斯的大型单晶,直径为86毫米,气缸长度为100毫米。它们以Czochralski方法在温度补偿切割(+ 48.5 / SPL型/; + 50 / SPL型/; + 50 / SPL DEG /; + 54 / SPL DEG / + 54 / SPL DEG / TO y轴)的方向上生长。本技术允许制作3“(76.2毫米)兰萨斯晶圆。该直径通过晶片周边的晶片周边的单位损耗,相对于整个晶片表面上的单位总数。为了在温度的方向上生长兰纳斯特与Z方向相比,切割允许通过垂直于晶体轴的锯片制造晶片。

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