Dependence of depletion-layer thickness on applied voltage in thermally poled fused silica

摘要

We reported on measurements of the depletion-layer thickness on fused silica poled under different poling voltages. Our results show a nearly quadratic dependence of the thickness with V. This indicates that different-mobility ions are involved in the poling process and shows that the poling dynamics plays an important role in the spatial distribution of the induced nonlinearity.