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Negative index growth in germanium-free nitrogen-doped planar SiO_2 waveguides

机译:无锗氮气掺杂平面SiO_2波导的负指数生长

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We have presented the growth of the average refractive index change and the refractive index modulation in germanium-free nitrogen-doped planar silica waveguides. No positive refractive index change could be observed indicating the absence of a type I grating. This also explaines the monotonous growth of the refractive index modulation. We could not observe a change in birefringence in the SiON waveguides induced by the UV exposure. This leads to the conclusion that UV-induced dilation or compaction is not the dominant mechanism causing the refractive index changes.
机译:我们已经介绍了平均折射率变化的增长和无锗氮掺杂平面二氧化硅波导的折射率调节。没有阳性折射率变化可以观察到表明不存在I型光栅。这也解释了折射率调制的单调生长。我们无法观察到由UV暴露引起的Sion波导中的双折射的变化。这导致紫外线诱导的扩张或压实不是导致折射率变化的主要机制。

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