Damage of Sc/Si multilayer mirrors exposed to intense nanosecond 46.9 nm laser pulses

机译：SC / Si多层镜的损坏暴露于强烈的纳秒46.9 nm激光脉冲

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The damage threshold fluence (～ 0.08 J/cm{sup}2) and damage mechanism of extreme ultraviolet Sc/Si multilayer coatings irradiated by 46.9 nm laser pulses of nanosecond duration are reported.

机译：报道了46.9nm激光脉冲的极紫外线SC / Si多层涂层的损伤阈值（〜0.08 j / cm {sup} 2）和纳秒持续时间的激光脉冲的损伤机理。

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《International Quantum Electronics Conference》|2004年||共1页
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G. Vaschenko; M. Grisham; C. S. Menoni; J. J. Rocca; Yu. P. Pershyn; E. N. Zubarev; D. L. Voronov; V. A. Sevryukova; V. V. Kondratenko; A. V. Vinogradov; I. A. Artioukov;
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4. Laser damage of the nonlinear crystals CdSiP_2 and ZnGeP_2 studied with nanosecond pulses at 1064 and 2090 nm [J] . Anne Hildenbrand, Christelle Kieleck, Aleksey Tyazhev, Optical engineering . 2014,第12期

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5. Damage of Sc/Si multilayer mirrors exposed to intense nanosecond 46.9 nm laser pulses [C] . G. Vaschenko, M. Grisham, C. S. Menoni, International Quantum Electronics Conference . 2004

机译：SC / Si多层镜的损坏暴露于强烈的纳秒46.9 nm激光脉冲
6. Double ionization of multi-electron atoms exposed to intense femtosecond laser pulses. [D] . Panfili, Raphael Peter. 2002

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机译：暴露于强烈的469-NM激光脉冲的极端紫外线SC / SI多层镜子损坏

Damage of Sc/Si multilayer mirrors exposed to intense nanosecond 46.9 nm laser pulses

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