Ultra-trace analysis of light elements and speciation of minute organic contaminants on silicon wafer surfaces by means of TXRF in combination with NEXAFS

摘要

Total reflection X-ray fluorescence spectroscopy (TXRF) using high flux synchrotron radiation (SR) for the specimen excitation is a powerful technique for the non-destructive analysis of very small amounts of both metal and low Z elements on silicon wafer surfaces.Several different TXRF experiments were conducted at the plane grating monochromator (PGM) beamline for undulator radiation within the radiometry laboratory of the Physikalisch-Technische Bundesanstalt (PTB) at the electron storage ring BESSY II,which provides photon energies between 0.1 keV and 1.9 keV for the specimen excitation.The PGM beamline is also very suitable for the standard XRF analysis of thin multi-elemental,multi-layered structures deposited on silicon surfaces.