Composition and Functional Properties of Organosilicon Plasma Polymers from Hexamethyldisiloxane and Octamethylcyclotetrasiloxane

摘要

Hybrid organic-inorganic thin films with different fractions of silicon oxide were deposited in rf capacitively coupled discharges using pure hexamethyldisiloxane(HMDSO),octamethylcyclotetrasiloxane(D4)or 5% HMDSO in O2.The deposition in continuous wave(cw)mode was compared with pulsed conditions under which the discharge on-time was 5 ms and the off-time varied from 0.5 to 15 ms.The chemical composition of the films was studied by FTIR,RBS and ERDA.Their optical properties in UV/visible/NIR were determined from spectroscopic ellipsometry and reflectance measurements fitted with a Kramers-Kronig consistent dispersion model based on a parametrization of density of states.Film hardness and reduced modulus were determined from depth sensing indentation tests.