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Characteristics of Lateral Transport in In_(0.35)Ga_(0.65)As/GaAs Quantum Dot Heterostructures with Variation of Size, Shape and Density of Quantum Dots

机译:in_(0.35)Ga_(0.65)的横向传输的特性,具有尺寸,形状和密度的变化,量子点的变化

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Using the temperature dependent Hall (TDH) effect and low temperature magneto-resistance (MR) measurements, lateral transport studies in In_(0.35)Ga_(0.65)As/GaAs quantum dot (QD) heterostructures were performed as a function of the in plane direction. Correlations between the anisotropic behavior of the electron mobility and the elliptical shape of InGaAs QDs were revealed through temperature variations. In addition, the lateral anisotropy is demonstrated to depend on the QD density. Possible mechanisms of the transport through the QD layer are discussed. The high temperature conductivity in heterostructures with QDs behaves quite differently than bulk GaAs and quantum well (QW) heterostructure and is dependent on the areal density of the dots. At low temperatures and high magnetic fields, the integer quantum Hall effect (IQHE) was measured in the Hall resistance and varies with the size and density of QDs. In addition, a negative longitudinal MR at low temperatures and low magnetic fields is found, dependent on the structural properties of the nanostructures. This occurrence of negative MR is most likely due to the weak localization of charged carriers and needs further investigations.
机译:使用温度依赖霍尔(TDH)效应和低温磁阻(MR)测量,在IN_(0.35)GA_(0.65)的横向传输研究作为/ GAAs量子点(QD)异质结构作为在平面中进行方向。通过温度变化揭示了电子迁移率的各向异性行为与InGaAs QD的椭圆形状之间的相关性。此外,对横向各向异性进行说明以取决于QD密度。讨论了通过QD层的传输的可能机制。具有QDS的异质结构中的高温导电性与散装GaAs和量子阱(QW)异质结构相比不同,并且取决于点的面密度。在低温和高磁场处,在霍尔电阻中测量整数量子霍尔效应(IQHE),随着QD的尺寸和密度而变化。另外,发现低温下的负纵向MR和低磁场,取决于纳米结构的结构性。这种负面先生的发生很可能是由于充电载体的弱本质,并且需要进一步调查。

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