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Electron stimulated desorption of deuterium from GaN(0001) surface

机译:电子刺激了GaN(0001)表面的氘的解吸

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Temperature programmed desorption (TPD) was performed on deuterated GaN(0001) surfaces which had been exposed to various doses of 90-eV electrons.TPD of the deuterated surface without electron exposure shows a broad D_2 desorption feature with a peak desorption temperature at approx400 degC.Electron exposure results in a decrease in intensity of the desorption peak whichis attributed to removal of surface deuterium by electron stimulated desorption (ESD).This removal of deuterium by ESD produces no change in the peak desorption temperature indicating that recombiantive desorption is first order in deuterium coverage.
机译:温度编程解吸(TPD)在氘代GaN(0001)表面上进行,该表面暴露于没有电子曝光的氘化表面的各种剂量的90-EV Electors.TPD,显示出宽D_2解吸特征,峰值解吸温度在大约400 deGC下。电子暴露导致解吸峰强度的强度降低,归因于通过电子刺激解吸(ESD)去除表面氘。这种通过ESD去除氘的除去峰解吸温度,表明重复性解吸是第一顺序的峰值解吸温度氘覆盖。

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