首页> 外文会议>Materials Research Society Symposium >Cu(In,Ga)(Se,S)_2 Absorbers Formed by Rapid Thermal Processing of Elemental Precursors: Analysis of Thin Film Formation and Implementation of A Large Area Industrial Process
【24h】

Cu(In,Ga)(Se,S)_2 Absorbers Formed by Rapid Thermal Processing of Elemental Precursors: Analysis of Thin Film Formation and Implementation of A Large Area Industrial Process

机译:通过快速热加工由元素前体的快速热加工形成的Cu(In,Ga)(Se,S)的吸收剂:分析薄膜形成和大面积工业过程的实施

获取原文

摘要

Large area Cu(In,Ga)(Se,S)_2 thin films (CIGSSe) for solar modules are processed by rapid thermal annealing of stacked elemental layers. A pilot line for 60 * 90 cm~2 absorbers and 30 * 30 cm~2 modules is now up and running. Modules with efficiencies at 12% are fabricated with excellent structural and electrical uniformity. For the optimization of electrical performance the selenization and sulfurization process is analyzed by x-ray fluorescence (XRFA), x-ray photo-electron spectroscopy (XPS), secondary ion mass spectroscopy (SIMS) and current voltage (I-V) measurements. Sequentially processed CIGSSe films show characteristic depth distribution profiles of gallium and sulfur. Based upon our previously published model obtained by In-Situ XRD analysis the Ga profile can be explained by the strongly inhibited formation of binary gallium-selenides. The sulfur incorporation is investigated by comparing XRFA data and SIMS profiles of samples from different sulfurization recipes. A characteristic dependence of S on the Cu/(In+Ga) ratio is observed. Two different mechanisms for sulfur incorporation are proposed. It will be shown that the accumulation of sulfur towards the back is predominantly due to the incorporation into an intermediate molybdenum sulfo-selenide layer. Device characterization shows that the Ga and S profiles lead to a favorable double band gap grading structure.
机译:大面积的Cu(的In,Ga)(SE,S)_2薄膜(的CIGSSe),用于太阳能电池组件由层叠的元素层的快速热退火处理。 60×90cm〜2吸收器的试验线,现在并运行30 * 30厘米〜2个模块。具有12%效率的模块以优异的结构和电均匀性制造。为了优化电性能,通过X射线荧光(XRFA),X射线光学电子谱(XPS),二次离子质谱(SIMS),电流电压(I-V)测量来分析硒化和硫化过程。顺序加工的CIGSSE薄膜显示了镓和硫的特征深度分布型材。基于通过原位XRD分析获得的先前发表的模型,可以通过强烈抑制二元镓 - 硒化族的形成来解释GA型材。通过比较来自不同硫化配方的样品的XRFA数据和SIMS型材来研究硫掺入。观察到S对Cu /(In + Ga)比的特征依赖性。提出了两种不同的硫掺入机制。将表明,由于掺入中间钼磺化硒层,硫的含量朝向背部的积累主要是主要的。设备表征示出Ga和S的型材导致有利的双带隙分级结构。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号