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Structural and Compositional Evolution of Self-Assembled Germanium Islands on Silicon (001) During High Growth Rate LPCVD

机译:高生长率LPCVD在硅(001)上自组装锗岛的结构和组成演变

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Understanding the process of self-organization of Ge nanostractures on Si with controlled size distribution is a key requirement for their application to devices. In this study, we investigate the temporal evolution of self-assembled islands during the low pressure chemical vapour deposition (LPCVD) of Ge on Si at 650°C using high growth rates (6-9 nm/min). The islands were characterized by atomic force microscopy, transmission electron microscopy, Rutherford backscattering spectrometry and micro-Raman spectroscopy. We found that the first nanostmctures to assemble were small islands, with a narrow size distribution, typical of the 'lens-shaped' structures reported in previous studies. Next to form were a population of larger 'lens-shaped' islands with a similar surface density to that of the small islands, but with broad height and width distributions. These islands differ from the pyramid-shaped islands previously reported for a similar size range. On further Ge deposition, the population evolves into one of large square-based truncated pyramids with a very narrow size distribution. Such pyramidal structures were previously reported at smaller sizes. Furthermore, we see no evidence of the multifaceted domes previously reported in this size range. The small 'lens-shaped' islands appear to be strained, whilst some of the intermediate-sized islands and all the large truncated pyramids contain misfit strain relaxation induced defects. Additionally, in the both the intermediate size 'lens-shaped' islands and in the large size truncated pyramidal islands, there is evidence of Si-Ge strain-induced alloying, more significant in the first than in the latter. Our observation of 'lens shaped' islands and truncated pyramids at larger sizes than are normally observed, suggests a kinetically driven process that delays the evolution of energetically favourable island structures until larger island sizes are reached.
机译:了解具有受控尺寸分布的Si上GE纳米分囊的自组织过程是其应用于设备的关键要求。在这项研究中,我们在使用高生长速率(6-9 nm / min)的650℃下,研究了在Si的低压化学气相沉积(LPCVD)期间自组装岛的时间演变。该岛的特征在于原子力显微镜,透射电子显微镜,Rutherford反向散射光谱和微拉曼光谱。我们发现,第一个组装的纳米阵列是小岛,具有窄尺寸分布,典型的“透镜形”结构在先前的研究中报告。旁边的形式是一个较大的“透镜形”岛屿,具有与小岛屿相似的表面密度,但具有宽高的高度和宽度分布。这些岛屿与先前报告的金字塔形岛屿不同,以举报类似的尺寸范围。在进一步的GE沉积上,群体演化到具有非常窄的尺寸分布的大型截短的金字塔中的一个。此前以较小的尺寸报告这种金字塔结构。此外,我们没有看到先前在这个大小范围内报道的多方面圆顶的证据。小的“透镜形”岛似乎被紧张,虽然一些中等岛屿和所有大截短的金字塔含有不足的应变松弛诱导的缺陷。另外,在中间尺寸的“透镜形的”岛上和大尺寸截短的金字塔岛中,有证据表明SI-GE应变诱导的合金化,在后者的第一中更显着。我们对较大尺寸的“透镜形”岛的观察比通常观察到的尺寸较大的尺寸,表明了动力学驱动的过程,延迟了大力良好的岛屿结构的演变,直到达到大岛尺寸。

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