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Localized Fabrication of Metal Contacts and Electrical Measurements on Multi waIled Carbon Nanotubes

机译:局部制造金属触点和多次张碳纳米管上的电气测量

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A Focused Ion Beam (FIB) microscope was used to locally deposit platinum contacts on Multiwalled Carbon Nanotubes (MWNTs) for resistance and current carrying capability measurements.We have determined the resistivity of these ultra-thin Pt lines and the MWNT-Pt contact resistance to account for contributions to the MWNT measurements.We have studied the effects of secondary metal deposition around the contacts ('halo' effect) on the MWNT electrical measurements as well as effects of ion beam exposure and possible ways to avoid/minimize them.Transmission Electron Microscopy data was used to evaluate MWNT surface modifications due to ion beam exposure and Pt deposition.
机译:聚焦离子束(FIB)显微镜用于局部沉积在多壁碳纳米管(MWNT)上的铂接触,用于电阻和电流承载能力测量。我们已经确定了这些超薄PT线的电阻率和MWNT-PT接触电阻考虑到MWNT测量的贡献。我们已经研究了二次金属沉积周围的触点('晕圈效应)的影响,以及离子束曝光的影响和避免/最小化它们的可能方法。传播电子显微镜数据用于评估由于离子束曝光和PT沉积引起的MWNT表面改性。

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