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A study of indium nitride films grown under conditions resulting in apparent band-gaps from 0.7eV to 2.3eV

机译:在条件下生长的氮化铟膜的研究导致表观带间隙为0.7EV至2.3EV

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The band-gap of indium nitride has long been believed to be about 1.9eV with slight variations due to band-tailing in polycrystalline samples and degenerate doping.Recently,other values as low 0.7eV have apparently been observed.We have compared samples spanning this apparent range of band-gap using secondary ion mass spectroscopy (SIMS).X-ray Photoelectron Spectroscopy (XPS) and heavy ion elastic recoil detection analysis (ERDA),in conjunction with spectral optical density measurements.Once structural inhomogeneiteies are taken into account,we show that much of the conflicting data are compatible with direct photoionisation with a threshold energy of about 1.0eV.This feature was first reported in polycrystalline indium nitirde over 15 years ago and attributed to a |p>like defect state.We ask whether the feature may instead be a direct band-gap.
机译:长期以来,氮化铟的带间隙已经被认为是大约1.9EV,由于多晶样品中的带尾,并且脱丁的带尾部具有轻微的变化,因此显然已经观察到低0.7eV的其他值。我们已经比较了跨越的样品使用二次离子质谱(SIMS).x射线光电子能谱(XPS)和重离子弹性反冲检测分析(ERDA)的表观带隙范围和重离子弹性反冲检测分析(ERDA)结合光谱光学密度测量。考虑到结构的不均匀性,我们表明大部分冲突数据与阈值能量的直接摄影兼容,阈值能量约为1.0EV。这一特征在15年前在多晶铟Nitinge中报道并归因于缺陷状态。我们询问特征可以是直接带隙。

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