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Block Copolymer Thin Films Above and Below the Order-Disorder Transition Temperature

机译:嵌段共聚物薄膜上方和低于订单障碍转变温度

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Symmetric diblock copolymers undergo a disorder to order transition below a microphase separation transition temperature. In this temperature range the structure is characterized by alternating lamellae of thickness L. In thin film geometries, the lamellae are oriented normal to the substrate if there is a preferential interaction between either of the block constituents and the substrate/copolymer or copolymer/vacuum interfaces. Depending on the relation between the film thickness and L, the topography of the film might comprise of holes, islands or spinodal-like structures. We show that in a polystyrene-b-poly(methyl methacrylate) diblock copolymer of molecular weight 20, 000 g/mol, above the microphase separation transition temperature, the topography of the film depends on the thickness. A heirarchy of bicontinuous patterns and holes is observed with increasing film thickness for films thinner than 35 nm.
机译:对称二嵌段共聚物经历紊乱以在微单分离转变温度以下顺序过渡。在该温度范围内,该结构的特征在于,如果在嵌段成分和基材/共聚物或共聚物/真空/真空界面中存在优先相互作用,则薄膜的厚度L.厚度L的厚度L.垂直于衬底。 。取决于膜厚度和L之间的关系,薄膜的形貌可能包括孔,岛或刺孔状结构。我们表明,在分子量20,000g / mol的聚苯乙烯-B-聚(甲基丙烯酸甲酯)二嵌段共聚物中,在微相分离转变温度以上,膜的形貌取决于厚度。观察到具有比35nm薄的薄膜厚度增加的薄膜厚度的双连续图案和孔的长度。

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