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Further developments in gold plating technology for microelectronics

机译:微电子镀金技术的进一步发展

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This paper will outline the status of Gold Plating Technology in Microelectronics, in particular, Pure Gold, and the technical requirements in terms of physical properties required for specific applications such as Bondable Pure Gold for BGA application. Current practice in BGA technology will be outlined and some practical guidelines for Process Control will be explored. Comparisons will be drawn between Acid Hard Gold and Pure Gold technology, in terms of contamination resistance, and the impact of such contaminants on the final deposit composition achieved, related to defined specifications.
机译:本文将概述微电子,特别是纯金的镀金技术的状态,以及在适用于BGA应用的可粘合纯金等特定应用所需的物理性质方面的技术要求。将概述BGA技术的目前的实践,并探讨了一些过程控制的实用指南。在酸硬金和纯金技术方面,在污染抗性方面将在酸性硬金和纯金技术之间进行比较,并且这些污染物对达到的最终沉积组合物的影响,与定义的规格相关。

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