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Electrodeposition of CdTe Semiconductor from Ammoniacal Aqueous Solution

机译:来自氨水水溶液的CdTe半导体电沉积

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Electrodeposition of CdTe was studied usingaqueous ammonia-alkaline electrolytic baths in which Cd~II- andTe~IV- ions are dissolving as Cd~II (NG_3)_4~2+andTe~IVO_3~2- ions, respectively. Ca-thodic polarization curves ofthe baths suggest the presence of strong interaction between theCd~II- and Te~IV- ions; electrodeposition of tellurium is inhibitedby the presence of Cd (NH_3)_4~2+ ions. The interaction makes itpossible to electrodeposit CdTe films with stoichiometriccomposition. Polycrystalline CdTe thin film of about 1 #mu#mthickness was electrodeposited at 343 K from ammonia-alkalinesolutions (pH bounds 10.7) containing TeO_3~2-(< 20 mmoldm~-3) and Cd(NH_3)_4~2+ (< 60 mmol dm~-3) ions. IncreasingCd(NH_3)_4~2+/TeO_3~2- mole ratio or decreasing totalconcentration of ammonia/ammonium - ion gave flat and smoothcrystalline CdTe deposits at constant cathode potential -0.70 to -0.30 V vs SHE at 343 K.
机译:研究了CdTe的电沉积水溶液水溶液,其中Cd〜II-和TE〜IVIONS分别溶解为CD〜II(Ng_3)_4〜2 + Andte〜IVO_3〜2-离子。浴的CA-烧焦偏振曲线表明THCD〜II-和TE〜IVION之间存在强烈相互作用;碲的电沉积受到CD(NH_3)_4〜2 +离子的存在。相互作用使电沉积Cdte膜具有化学计量耦合。在含有TeO_3〜2 - (<20mmoldM〜-3)和Cd(NH_3)_4〜2 +(<60)的含有TEO_3〜2 - (<20mmoldM〜-3)和CD(NH_3)_4〜2 +(<60)的氨基 - 碱(pH界10.7),在343k中电沉积在343k中的多晶CDTE薄膜。(NH_3)_4〜2 +(<60 Mmol DM〜3)离子。氨/铵 - 离子的恒温电位下的平坦和平坦的Cdte Cdte沉积物的增加(NH_3)_4〜2 + / TEO_3〜2-摩尔比或在343k的恒定阴极电位下进行平坦和光滑的晶状体CDTE沉积物。

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