首页> 外文会议>Symposium on thin-films - Stresses and mechanical properties >Stress evolution in sputtered FCC metal multilayers
【24h】

Stress evolution in sputtered FCC metal multilayers

机译:溅射FCC金属多层的压力演变

获取原文

摘要

During growth of Cu/Pd multilayers the aparent stress in the Cu layers changes from compressive to tensile during the growth of a single Cu layer. The apparent stress in the Pd layers is initially either tensile or compressive depending on the thickness of the underlying Cu layer. It has been speculated that this stress behaviour may be either a result of island growth of Cu on Pd or alloying at the Cu/Pd interface [1]. We have observed that the stress behavior is similar in Cu/Pd and Pd/Pt multilayers and continue to study these systems to better understand the origins of stress in metal multilayers. Stress evolution during growth is monitored by in-situ substrate curvature measurement using a multiple parallel laser beam technique. High angle superlattice spectra for the multilayers are found from symmetric x-ray diffraction scans in order to determine crystallographic texture. Information about interfacial disorder and alloying in the layers is obtained from simulation of the superlattice diffraction patterns. Stress behaviour is correlated with possible modes of growth of the layers, and with atomic peening and coherency effects.
机译:在Cu / Pd多层的生长期间,Cu层中的测力在单个Cu层的生长期间从压缩到拉伸变化。根据下层Cu层的厚度,Pd层中的表观应力最初是拉伸或压缩。已经推测,这种应力行为可能是Cu / Pd接口在Cu / Pd接口上的Cu岛生长的结果[1]。我们观察到,Cu / Pd和Pd / Pt多层的应力行为类似,继续研究这些系统,以更好地了解金属多层的压力的起源。使用多个并联激光束技术通过原位衬底曲率测量监测生长期间的应力演变。来自对称X射线衍射扫描的多层的高角度超晶格光谱,以确定晶体纹理。关于层中的界面障碍和合金化的信息是从超晶格衍射图案的模拟获得的。应力行为与层的可能生长模式相关,原子喷丸和相干效应相关。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号