首页> 外文会议>Symposium on semiconductor process and device performance modelling >Modelling analysis of oxygen transport during czochralski growth of silicon crystals
【24h】

Modelling analysis of oxygen transport during czochralski growth of silicon crystals

机译:硅晶体Czochralski生长期间氧气运输的建模分析

获取原文
获取外文期刊封面目录资料

摘要

Global model of oxygen transport in the melt and inert gas is proposed which is based on coupled two-dimensional stationary modeling of global heat transfer, Laminar flow of inert gas and turbulent flow in Si melt, and transport of dissolved oxygen in the melt and SiO vapor in the gas. The model allows to study effects of process parameters like flow rate and pressure of inert gas, and rotation of the crucible on incorporation of oxygen into Si crystal.
机译:提出了熔融和惰性气体中的氧气运输模型,其基于全局传热的耦合二维静止建模,惰性气体的层流和Si熔体中的湍流,以及熔体和SiO中的溶解氧的运输气体中的蒸气。该模型允许研究过程参数等流量和惰性气体压力的影响,并将坩埚掺入氧气进入Si晶体。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号