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Synthesis of microcrystalline silicon films by plasma enhanced chemical vapor deposition using multiple inductively-coupled-plasma modules with low-inductance antenna

机译：用低电感天线的多种电感耦合等离子体模块通过等离子体增强化学气相沉积来合成微晶硅膜

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Microcrystalline silicon thin films were prepared on glass substrates at low temperature (400°C) by plasma enhanced chemical vapor deposition using an inductively-coupled plasma (ICP) source.

机译：使用电感耦合等离子体（ICP）源等离子体增强的化学气相沉积在低温（400℃）的玻璃基板上制备微晶硅薄膜。

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《International Microprocesses and Nanotechnology Conference》|2002年||共1页
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A. Ebe; H. Inami; S. Baba; N. Yamamoto; Y. Setsuhara; T. Shoji; S. Miyake;
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专利

1. Characterization of Amorphous Hydrogenated Carbon Formed by Low-Pressure Inductively Coupled Plasma Enhanced Chemical Vapor Deposition Using Multiple Low-Inductance Antenna Units [J] . Osamu Tsuda, Masatou Ishihara, Yoshinori Koga, The journal of physical chemistry, B. Condensed matter, materials, surfaces, interfaces & biophysical . 2005,第11期

机译：低压感应耦合等离子体增强化学气相沉积使用多个低电感天线单元形成的非晶氢化碳的表征
2. Large-Area and High-Speed Deposition of Microcrystalline Silicon Film by Inductive Coupled Plasma using Internal Low-Inductance Antenna [J] . Eiji TAKAHASHI, Yasuaki NISHIGAMI, Atsushi TOMYO, Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers . 2007,第3B期

机译：使用内部低电感天线的电感耦合等离子体大面积高速沉积微晶硅膜
3. Influence of deposition temperature on microcrystalline silicon thin film prepared by plasma enhanced chemical vapor deposition [J] . Chen L.-L., Wang S.-Z., Yin Y.-P., Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2012,第Null期

机译：沉积温度对等离子增强化学气相沉积法制备微晶硅薄膜的影响
4. Synthesis of microcrystalline silicon films by plasma enhanced chemical vapor deposition using multiple inductively-coupled-plasma modules with low-inductance antenna [C] . A. Ebe, H. Inami, S. Baba, International Microprocesses and Nanotechnology Conference . 2002

机译：用低电感天线的多种电感耦合等离子体模块通过等离子体增强化学气相沉积来合成微晶硅膜
5. Plasma enhanced chemical vapor deposition of silicon thin films: Characterization of film growth at different frequencies and gas compositions utilizing plasma diagnostics. [D] . Zhu, Lala. 2014

机译：等离子体增强了硅薄膜的化学气相沉积：利用等离子体诊断技术表征不同频率和气体成分下的薄膜生长。
6. Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films [O] . Mateusz Œmietana, Robert Mroczyński, Norbert Kwietniewski 2014

机译：射频等离子体增强化学气相沉积（RF PECVD）反应器中样品高度对氮化硅薄膜光学性能和沉积速率的影响
7. Influence of Deposition Temperature on Microcrystalline Silicon Thin Film Prepared by Plasma Enhanced Chemical Vapor Deposition [O] . 2016

机译：沉积温度对等离子体增强化学气相沉积制备微晶硅薄膜的影响

Synthesis of microcrystalline silicon films by plasma enhanced chemical vapor deposition using multiple inductively-coupled-plasma modules with low-inductance antenna

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