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The fabrication of thin film NiTi shape memory alloy micro actuator for MEMS application

机译:用于MEMS应用的薄膜NITI形状记忆合金微致动器的制造

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Thin film SMA (Shape memory alloy) is a useful method for MEMS (Microelectromechanical Systems) actuator. This is because the thin film has an improved frequency response compared to bulk SMA, high work density, and produces large strain. A novel two-way thin film NiTi (Nickel Titanium) shape memory alloy actuator is presented in this paper. Thin film shape memory alloy is sputter-deposited onto a silicon wafer in an ultra high vacuum system. Transformation temperatures of the deposited NiTi film are measured by residual stress measurement at temperatures from 25 °C to 120 °C. Test results show that the M{sub}f (Martensite Finish Temperature) is around 60 °C and A{sub}f (Austenite Finish Temperature) is around 110 °C. A free standing NiTi membrane (10 mm × 10mm and 3 μm thick) is fabricated using MEMS technology. We found that a mixture of HF (Hydro Fluidic Acid), HNO{sub}3 (Nitric Acid) and DI (Deionized) water with thick photo resist mask works best for the fabrication process. The membrane is hot-shaped in different shapes such as dome shape, pyramidal shape, and cylindrical shape. Results indicate that when the temperature of the NiTi film exceeds A{sub}f, the NiTi membrane transforms into the trained hot-shape. When the temperature cools down to room temperature, the membrane returns to the initial flat shape.
机译:薄膜SMA(形状记忆合金)是MEMS(微机电系统)执行器的有用方法。这是因为薄膜与散装SMA,高工作密度相比具有改进的频率响应,并产生大应变。本文提出了一种新型双向薄膜NITI(镍钛)形状记忆合金致动器。薄膜形状记忆合金在超高真空系统中溅射到硅晶片上。沉积的Niti膜的转化温度通过在25℃至120℃的温度下残留应力测量来测量。测试结果表明,M {亚} F(马氏体净温温度)约为60°C,A {亚} F(奥氏体结束温度)约为110℃。使用MEMS技术制造自由驻地NITI膜(10mm×10mm和3μm厚)。我们发现,具有厚光电掩模的HF(水力流体化酸),HNO} 3(硝酸)和二(去离子)水的混合物最适合制造工艺。膜具有不同形状的热形,例如圆顶形状,金字塔形状和圆柱形。结果表明,当NITI膜的温度超过{SUB} F时,NITI膜变成训练的热形。当温度冷却至室温时,膜返回到初始扁平形状。

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