Reverse phase-contrast problem in optical technology

摘要

This paper presents a new and simple technique of phase retardation measurement. It is based on computer aided analysis of diffraction pattern generated by phase object. Application of this method to known intensity distribution in Fourier spectrum allows to find phase distribution in an object. The method is especially aligned for techniques where an unknown phase modulation is gained by exposure of a photo-sensitive media. The described method can help to predict the desired phase shift from exposure and is especially aligned to the problem of Holographic Optical Elements (HOE) manufacturing.