Diode laser-induced pyrolytic decomposition of spin-coated organometallic thin films

摘要

We have developed a compact and reliable diode laser-based system for the direct writing of metals from thin organometallic films deposited onto polyimide and SiO$-2$/ substrates. This system uses an AlGaAs diode laser array, emitting at $lambda $EQ 796 nm with a maximum power of 1 W. A commercially available gold ink was spin-coated onto the substrate to form the precursor film. Direct writing was achieved by focusing the laser beam onto the film and by moving the substrate at speeds ranging from 10 to 15,000 $mu@m/s. We deposited gold lines 2 - 12 $mu@m wide onto SiO$-2$/ and 13 - 17 $mu@m wide onto polyimide; a thickness of 0.1 $mu@m was evaluated by profilometry. Conductive deposits with resistivities of 30 $mu approximately ega$DOT@cm were obtained on polyimide with good reproducibility at high writing speeds. The selective electroless plating of copper was achieved onto the gold lines deposited on SiO$-2$/. However, prior annealing was necessary to obtain reproducible plating.