Chemical deposition of large-area silver sulphide films

摘要

In this paper, we report on the chemical deposition of a large area ($APEQ 50 cm$+2$/) of Ag$-2$/S films from an acidic medium using thioacetamide as a sulpher source. The effect of deposition temperature from 8 to 55$DGR@C was studied. The electrical resistivity microstructure and XRD of the films have studied. Photoelectrochemical cells showed that the films are n type and photoactive in nature.