New ultra large field submicron i-line stepper for advanced mix-and-match applications

摘要

Lens and stage technologies that vastly reduce lithography processing costs, which have been incorporated into the Model 2244i ultra-large-field submicron i-line stepper, are described. It is shown how the technology reduces the overall cost of producing IC devices. The 2244i features a 22-mm*44-mm rectangular or 27-mm square field size. This field size, coupled with an extremely fast and accurate linear motor wafer stage, permits imaging up to 80,200 mm wafers per hour. It comfortably fits two 22-mm*22-mm fields from the most advanced reduction steppers. It's i-line lens has a production resolution of 0.8 mu m. This allows imaging of a majority of process levels (noncritical levels) for even the most advanced devices. The technological benefits of this system are presented along with cost-of-ownership models that demonstrate a marked improvement in production costs. The throughput advantages are also explored in terms of fabrication productivity.