The behavior of dimethylcadmium (DMCd) molecules chemisorbed on n-type Si(100) with native oxide in ultrahigh vacuum conditions at room temperature and the photoprocesses in the adlayer induced by resonant excitation of DMCd by KrCl laser pulses have been studied using desorption mass spectroscopy. 222 nm irradiation resulted in both the efficient complete dissociation of the initially adsorbed organometallic molecules and the photoionization of fragments desorbed from the substrate surface. One-photon release of methyl radicals from chemisorbed DMCd species was observed. The nature of adsorbed species and the mechanisms of photoprocesses are discussed.
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