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Kinetics of Hydrogen Abstraction and Addition Reactions of 3-Hexene by OH Radical

机译:oh激进的氢抽取动力学和3-己烯的添加反应

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Rate coefficients of H-atom abstraction and addition reactions of 3-hexene by the hydroxyl radical (OH) were determined using canonical variational transition-state theory, with potential energy surface evaluated at the CCSD/CBS//BHandHLYP/6-311G (d, p) level and quantum mechanical effect corrected by the multi-dimensional small-curvature tunneling method. Results reveal that accounting for approximate 70% of the overall H-atom abstractions occur in the allylic site via both direct and indirect channels. The indirect channel containing two Van der Waals pre-reactive complexes exhibits two times higher rate coefficient relative to the direct one. The OH-addition reaction also contains two Van der Waals complexes, and its submerged barrier results in a negative temperature coefficient behavior at low temperatures. In contrast, the OH-addition pathway dominates only at the temperatures below 590 K whereas the H-atom abstraction reactions dominate overwhelmingly at the temperature over 590 K. All of the rate coefficients calculated with an uncertainty of a factor of 5 were estimated. Analyses on the potential energy surface and minimum reaction path were also performed in this study.
机译:使用规范变分过渡状态理论测定H-原子抽取和3-己烯的添加反应的速率系数,在CCSD / CBS // BHANDHLYP / 6-311G中评估潜在的能量表面(D. P)水平和量子机械效果通过多维小曲率隧道法校正。结果表明,通过直接和间接渠道,算法占整个H原子抽象的近似70%。含有两种范德瓦尔斯预反应性复合物的间接通道具有相对于直接速率率高的两倍倍。 OH-加法反应还含有两种范德华复合物,其浸没屏障在低温下导致负温度系数行为。相反,OH-加法途径仅在低于590 k的温度下占主导地位,而H-Atom抽象反应在超过590k的温度下压倒地位。估计具有5倍的不确定性的所有速率系数。在本研究中还进行了潜在能量表面和最小反应路径的分析。

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