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An Assessment of Chemical Vapor Deposition Synthesis of SnO_2 Nanowires by Statistical Design

机译:统计设计评估SnO_2纳米线的化学气相沉积合成

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This paper studies the chemical vapor deposition (CVD) synthesis conditions for tin oxide (SnO_2) nanowires (NWs) by using statistical design of experiment (DOE). The influences of synthesis parameters (growth temperature, deposition time and flow rate of argon) on SnO_2 NWs diameter were studied. From perturbation analysis with DOE, it was found that temperature gave the most significant effect to the diameter of SnO_2 NWs via CVD method followed by flowrate of argon and deposition time. Furthermore, based on the cube graph, the smallest SnO_2 NWs (~18 nm) can be obtained at temperature of 850°C with argon flow rate of 100 seem using a deposition time of 60 min. On the other hand, the largest SnO_2 NWs (-248 nm) can be produced at 900°C.
机译:本文通过使用实验统计设计研究氧化锡(SnO_2)纳米线(NWS)的化学气相沉积(CVD)合成条件(DOE)。研究了合成参数(氩气的生长温度,沉积时间和流速)对SnO_2 NWS直径的影响。通过使用DOE的扰动分析,发现温度对SnO_2NWS的直径通过CVD方法进行了最显着的影响,然后是氩气和沉积时间的流量。此外,基于立方体图,可以在850℃的温度下获得最小的SnO_2NWS(〜18nm),其氩流量为100似乎使用60分钟的沉积时间。另一方面,最大的SnO_2 NWS(-248nm)可以在900°C下生产。

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