首页> 外文会议>SPIE Conference on Light-Emitting Diodes: Materials, Devices, and Applications for Solid State Lighting >Enhanced Performance of Vertical GaN-Based LEDs with a Highly Reflective Ohmic Contact and a Nano-Roughened Indium-Zinc Oxide Transparent Conduction Layer
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Enhanced Performance of Vertical GaN-Based LEDs with a Highly Reflective Ohmic Contact and a Nano-Roughened Indium-Zinc Oxide Transparent Conduction Layer

机译:具有高反射欧姆触点的垂直GAN的LED的增强性能和纳米粗糙铟 - 氧化铟锌透明导电层

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The use of Polystyrene Spheres (PSs) to realize nano-roughened Indium-Zinc Oxide (IZO) surface and a high reflective ohmic p-contact to improve the optoelectronic properties of larger-area (1 × 1 mm~2) vertical metallic-substrate GaN-based light-emitting diodes (VLEDs) were proposed and investigated. A metal system consisting of annealed- Pt/Al/Pt was employed to serve as a reflector and ohmic contact to p-GaN, which exhibits a good ohmic contact ( 1.84× 10~(-3) Ωcm~2) and high reflectivity (88% at 465 nm). After the removal of sapphire using laser lift-off process (LLO) and etching of u-GaN by ICP, Ti/IZO film was then deposited to serve as a transparent conduction layer (TCL). After that, the polystyrene spheres (PSs) were dispersed on the IZO surface, followed by second sputtering-deposition of IZO film to fill the space between neighboring PSs. The PSs were then removed to form a nano-roughened IZO top-layer. Compared to regular VLEDs with Ni/Au ohmic contact and Ti/Al/Ti/Au as reflector layer, the fabricated VLED shows a typical increase in light output power (i.e., ΔLop/Lop) by 72.2% at 350 mA and a decrease in forward voltage (Vf) from 3. 43 V down to 3.33 V. It is expected that the proposed PSs nano-roughening technology and high reflection annealed-Pt/Al/Pt metal system for ohmic contact to p-GaN would be a potential candidate for the fabrication of high power GaNbased LEDs for solid-state lighting in the near future.
机译:使用聚苯乙烯球体(PSS)来实现纳米粗产铟 - 氧化锌(IZO)表面和高反射欧姆p接触,以改善较大面积(1×1mm〜2)垂直金属基材的光电性能提出并调查了基于GaN的发光二极管(VLED)。用退火-PT / Al / Pt组成的金属系统用作对P-GaN的反射器和欧姆接触,其表现出良好的欧姆接触(1.84×10〜(-3)Ωcm〜2)和高反射​​率( 465 nm的88%。在使用激光剥离过程(LLO)去除蓝宝石之后并通过ICP蚀刻U-GaN,然后​​沉积Ti / Izo膜作为透明导电层(TCl)。之后,将聚苯乙烯球体(PSS)分散在IZO表面上,然后通过第二溅射沉积的IZO膜填充相邻PS之间的空间。然后除去PSS以形成纳米粗糙的IZO顶层。与Ni / Au欧姆接触和Ti / Al / Ti / Au为反射器层的常规VLEMS相比,制造的VLED显示出光输出功率(即,ΔLOP/ LOP)的典型增加72.2%,在350 mA下降,减少从3. 43 V下降到3.33 V的正向电压(VF)预计建议的PSS纳米粗化技术和高反射退火-Pt / Al / Pt金属系统与P-GaN的欧姆接触将是潜在的候选者用于在不久的将来制造高功率GaNABASED LED以在不久的将来的固态照明。

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