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Study of the Deposition of Mixed Cerium oxide Thin Films by Reactive Magnetron Sputtering for the Development of Corrosion Protective Coatings

机译:反应磁控溅射混合氧化铈薄膜沉积腐蚀保护涂层的沉积研究

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CeO_x thin films (100 nm) were synthesized by direct current (DC) reactive magnetron sputtering (MS) on Al substrates. Depositions were performed at 5 mTorr with varying O_2 content in order to affect plasma chemistry and properties of the films. X-ray photoelectron spectroscopy (XPS) data revealed that, whatever the deposition conditions, the top surface is strongly oxidized. By depth profiling it appears that the chemical profile is composed (from film-surface to films-substrate interface) of three regions: the Ce~(4+) top surface, a Ce~(4+)/Ce~(3+) oxides mixture and finally a Ce~(3+) oxide region. Oxidation state gradient suggests a post-deposition oxidation of the surface of the coatings, propagating at a different rate depending on the microstructure of the films. Cross-sectional investigations by field emission gun scanning electron microscope (FEG-SEM) allowed identifying and visualizing microstructural differences. Results of corrosion tests (polarization curves, electrochemical impedance spectroscopy) support spectroscopic and microstructural findings.
机译:CEO_X薄膜(100nm)通过直流(DC)反应性磁控溅射(MS)在Al基材上合成。沉积在5mTorr以不同的O_2含量进行,以影响膜的血浆化学和性质。 X射线光电子能谱(XPS)数据显示,无论沉积条件如何,顶表面都被强氧化。通过深度分析,似乎化学型材(从薄膜表面到薄膜 - 衬底界面)的三个区域:Ce〜(4+)顶表面,Ce〜(4 +)/ Ce〜(3+)氧化物混合物,最后是Ce〜(3+)氧化物区域。氧化状态梯度表明涂层表面的沉积后氧化,根据薄膜的微观结构以不同的速率传播。现场发射枪扫描电子显微镜(FEG-SEM)的横截面研究允许识别和可视化微观结构差异。腐蚀试验结果(偏振曲线,电化学阻抗谱)支持光谱和微观结构发现。

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