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An investigation on the In doping of ZnO thin films by spray pyrolysis

机译:喷雾热解ZnO薄膜掺杂调查

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Indium doped zinc oxide (IGZO)thin films are gaining much interest owing to its commercial application as transparent conductive oxide thin films. In the current study thin films indium doped ZnO thin films have been deposited on glass substrates by chemical spray pyrolysis technique with an indium concentration of 1, 2.5 and 4% in Zinc source. The films show a peak shift in the X-Ray Diffraction patterns with varying indium doping concentration. The (101) peak was enhanced for the 2.5 % indium doped films and variation in grain size with the different doping levels was studied. The as-deposited films are uniform and shown high transparency (>90%) in the visible region. Average thicknesses of films are found to be 800nm, calculated using the envelope method. The film with 2.5 % of indium content was found to be highly conducting than the rest, since for the lower and higher concentrations the conductivity was possibly halted by the limit in carrier concentration and indium segregation in the grain boundaries respectively. The enhancement of mobility and carrier concentration was clearly seen in the optimum films.
机译:由于其商业应用作为透明导电氧化物薄膜,掺杂掺杂氧化锌(IgZO)薄膜的含量很大。在目前的研究中,薄膜通过化学喷雾热解技术沉积在玻璃基板上,锌源中的铟浓度为1,2.5和4%的玻璃基板上沉积在玻璃基板上。薄膜在具有不同铟掺杂浓度的X射线衍射图中显示峰值偏移。对(101)峰的峰值增强了2.5%掺杂薄膜,研究了具有不同掺杂水平的晶粒尺寸的变化。沉积的薄膜是均匀的并且在可见区域中示出了高透明度(> 90%)。发现薄膜的平均厚度为800nm,使用包络方法计算。发现具有2.5%的铟含量的薄膜比其余的高度导电,因为对于较低且较高浓度,电导率可能通过分别在载体浓度和晶界中的铟偏析中被停止。在最佳薄膜中清楚地看到了迁移率和载体浓度的增强。

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