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Annealing Induced Structural Changes In Amorphous Co_(23)Fe_(60)B_(17) Film On Mo Buffer Layer

机译:退火诱导在MO缓冲层上的无定形CO_(23)Fe_(60)B_(60)B_(17)膜中的结构变化

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Structural changes occurring in a thin amorphous Co_(23)Fe_(60)B_(17) film sandwiched between two Mo layers, as a function of thermal annealing has been studied. Thermal stability of the Co_(23)Fe_(60)B_(17) film is found to be significantly lower than the bulk ribbons. SIMS measurements show that during crystallization, boron which is expelled out of the crystallites, has a tendency to move towards the surface. No significant diffusion of boron in Mo buffer layer is observed. This result is in contrast with some earlier studies where it was proposed that the role of buffer layer of refractory metal is to absorb boron which is expelled out of the bcc FeCo phase during crystallization.
机译:在夹在两个Mo层之间的薄无定形CO_(23)Fe_(60)Fe_(60)Fe_(60)的薄膜中发生的结构变化,作为热退火的函数。 CO_(23)Fe_(60)B_(17)膜的热稳定性被发现显着低于散装带。 SIMS测量表明,在结晶期间,被驱逐出微晶的硼,具有向表面移动的趋势。观察到硼在Mo缓冲层中没有显着扩散。该结果与一些早期的研究相反,提出了难熔金属的缓冲层的作用是吸收在结晶期间被排出的BCC FeCo相排出的硼。

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