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Probing Depth Dependent Structure and Magnetic Properties of Thin Films Using Polarized Neutron Reflectivity

机译:偏振中子反射率探测薄膜的深度依赖性结构和磁性

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Novel properties of materials produced using nanoscale manufacturing processes often arise from interactions across interfaces between dissimilar materials. In order to understand the physical and magnetic properties of such nanostructures, a thorough and detailed structural and magnetic characterization with interface specificity is required. X-ray reflectivity and polarized neutron reflectivity (PNR) are two nondestructive techniques that provide quantitative measures of the chemical and magnetic depth profiles of the films with less than nanometer resolution averaged over the lateral dimensions of the entire sample (typically 100 mm2). PNR specifically gives simultaneous structure and magnetic information of the interfaces. Unquestionably, neutron reflectivity has played a decisive role in the development and study of new emergent phenomena at interfaces.
机译:使用纳米级制造工艺产生的材料的新颖性能通常来自不同材料之间的界面的相互作用。为了了解这种纳米结构的物理和磁性,需要具有界面特异性的彻底和详细的结构和磁性表征。 X射线反射率和偏振中子反射率(PNR)是两个非破坏性技术,其提供了薄膜的化学和磁深轮廓的定量测量,该薄膜的薄膜具有小于整个样品的横向尺寸(通常为100mm2)的横向尺寸。 PNR具体地给出了接口的同时结构和磁信息。毫无疑问,中子反射率在接口新兴现象的发展和研究中发挥了决定性作用。

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