Electrochromic performance of RF sputtered WO_3 thin films by Li ion intercalation and de-intercalation

摘要

Tungsten oxide (WO_3) thin films were prepared by RF sputtering technique at room temperature and 300°C as substrate temperatures keeping the sputtering powers as 100, 150, 200 and 250 W. Films were subjected various characterization like structural by XRD, surface morphology by SEM, composition analysis by EDX, and optical band gap by UV-Vis-NIR spectrometer. Optimized films were used for iono-optical studies using Li ion as intercalation and de-intercalation. Electrochromic parameters were evolved and reported.