X-Ray Reflectivity and Photoelectron Spectroscopy Study of Aluminum Oxide Thin Film

摘要

Structural characterization and in-depth compositional analysis of aluminum oxide thin film is carried out using soft X-ray reflectivity (SXR) and X-ray photoelectron spectroscopy (XPS) techniques. XPS analysis confirms that the film is comprised of both A1O_x and Al_2O_3 phases. In depth analysis of XPS data suggest that the A1O_x phase is dominant in uppermost surface of the film while the stoichiometric oxide is dominant in depth.