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Effect Of Doping On Electronic Properties Of HgSe

机译:掺杂对HGSE电子性质的影响

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First principle study of electronic properties of pure and doped HgSe have been performed using all electron Full Potential Linearized Augmented Plane Wave (FP-LAPW) method using ELK code. The electronic exchange and co-relations are considered using Generalized Gradient Approach (GGA). Lattice parameter, Density of States (DOS) and Band structure calculations have been performed. The total energy curve (Energy vs Lattice parameter), DOS and band structure calculations are in good agreement with the experimental values and those obtained using other DFT codes. The doped material is studied within the Virtual Crystal Approximation (VCA) with doping levels of 10% to 25% of electrons (hole) per unit cell. Results predict zero band gap in undopedHgSe and bands meet at Fermi level near the symmetry point Γ. For doped HgSe, we found that by electron (hole) doping, the point where conduction and valence bands meet can be shifted below (above) the fermi level.
机译:使用ELK码的所有电子全电位线性化增强平面波(FP-LAPW)方法进行了纯和掺杂HGSE电子性质的第一原理研究。使用广义梯度方法(GGA)考虑电子交换和共同关系。已经进行了格子参数,状态密度(DOS)和带结构计算。总能量曲线(能量Vs格子参数),DOS和频带结构计算与实验值吻合良好,使用其他DFT代码获得的那些。在虚拟晶体近似(VCA)内研究掺杂物质,每单位电池的掺杂水平为10%至25%的电子(孔)。结果预测undedhgse的零带隙和在对称点γ附近的费米水平上满足的零点隙。对于掺杂的HGSE,我们发现通过电子(孔)掺杂,导通和价带相遇的点可以在低于(上方)Fermi水平。

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