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Preferred C-axis Oriented Photoluminescent ZnO Thin Films Prepared by RF Magnetron Sputtering

机译:优选的C轴取向光致发光ZnO薄膜通过RF磁控溅射制备

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Undoped ZnO thin films were prepared by RF magnetron sputtering at 300°C. High value of optical transparency, distinct (002) preferential crystallographic orientation, high growth rate, good electrical conductivity and surface roughness are obtained at 200 W of RF power. XRD and Raman studies reveal good crystallinity with c-axis orientation. The Photoluminescence spectrum shows UV, violet, blue and green emission from the material.
机译:在300℃下通过RF磁控溅射制备未掺杂的ZnO薄膜。光学透明度的高值,不同(002)优先晶体取向,高生长速率,高生长速率,良好的电导率和表面粗糙度在200W的RF功率下获得。 XRD和拉曼研究显示了C轴取向的良好结晶度。光致发光光谱显示紫外线,紫,蓝色和绿色发射物料。

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